High-quality substrates can be provided with high throughput and low cost!
- Ideal for etching and cleaning processes.
- Chemical treatment is done using a spin method, and rinse drying is done using a conveyor method.
- Proven track record of high throughput support with W-lane configuration.
- Measures against hazardous corrosive gases during etching:
◎ Equipped with front and rear shutters and rollers in the spin chamber.
- Features temperature control circulation and reuse function for chemicals, as well as concentrated/diluted separation function for wastewater.
- Swing spray function during rinsing can also be installed.
- Up and down air knife drying designed to prevent reattachment of rinse water splashes.
*For more details, please refer to the PDF document or feel free to contact us.
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